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Toluene AR 200L
9476-09-200L
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Danger
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Formula: C6H5CH3 MW: 92,14 g/mol Boiling Pt: 110,6 °C (1013 hPa) Melting Pt: –95 °C Density: 0,867 g/cm³ (20 °C) Flash Pt: 4 °C Storage Temperature: Ambient |
MDL Number: MFCD00008512 CAS Number: 108-88-3 EINECS: 203-625-9 UN: 1294 ADR: 3,II REACH: 05-2114615130-69 Merck Index: 12,09667 |
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For Microelectronic Use | |
Assay (C6H5CH3) (by GC) | ≥ 99.5 % |
Color (APHA) | ≤ 10 |
Acidity (µeq/g) | ≤ 0.2 |
Residue after Evaporation | ≤ 2.0 ppm |
Water (by KF, coulometric) | ≤ 0.03 % |
Substances Darkened by H2SO4 | Passes Test |
Su lfur Compounds (as S) | ≤ 0.003 % |
Chl oride (Cl) | ≤ 2 ppm |
Phos phate (PO4) | ≤ 0.5 ppm |
Trace Impurities - Alumin um (Al) | ≤ 20 ppb |
Arse nic and Antim ony (as As) | ≤ 10.0 ppb |
Trace Impurities - Ba rium (Ba) | ≤ 10.0 ppb |
Trace Impurities - Bor on (B) | ≤ 20.0 ppb |
Trace Impurities - Cadm ium (Cd) | ≤ 20.0 ppb |
Trace Impurities - Calc ium (Ca) | ≤ 100.0 ppb |
Trace Impurities - Chro mium (Cr) | ≤ 10.0 ppb |
Trace Impurities - Co balt (Co) | ≤ 20 ppb |
Trace Impurities - Cop per (Cu) | ≤ 20.0 ppb |
Trace Impurities - Galli um (Ga) | ≤ 50 ppb |
Trace Impurities - Germ anium (Ge) | ≤ 50.0 ppb |
Trace Impurities - G old (Au) | ≤ 20 ppb |
Heavy Metals (as Pb) | ≤ 500.0 ppb |
Trace Impurities - Iro n (Fe) | ≤ 20.0 ppb |
Trace Impurities - Lith ium (Li) | ≤ 20.0 ppb |
Trace Impurities - Mag nesium (Mg) | ≤ 10.0 ppb |
Trace Impurities - Mang anese (Mn) | ≤ 10.0 ppb |
Trace Impurities - Nic kel (Ni) | ≤ 20.0 ppb |
Trace Impurities - Pota ssium (K) | ≤ 50 ppb |
Trace Impurities - Sili con (Si) | ≤ 100.0 ppb |
Trace Impurities - Sil ver (Ag) | ≤ 20.0 ppb |
Trace Impurities - Sod ium (Na) | ≤ 100.0 ppb |
Trace Impurities - Stro ntium (Sr) | ≤ 10.0 ppb |
Trace Impurities - Ti n (Sn) | ≤ 30.0 ppb |
Trace Impurities - Zi nc (Zn) | ≤ 20.0 ppb |
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